Application of Nonequilibrium Plasma Chemical Reactions Using Pulsed Silent Discharge to Efficient Generation of Active Oxygen Species

Oxygen atoms play a very importtant role in the atomospheric chemical vapor deposition of silicon dioxide films using tetraethylorthosilicate (TEOS) and ozone. In this study, the efficient generation of active oxygen species included these oxygen atoms has been carried out by use of pulsed silent discharge utilizing fast rising voltage. Discharge and generation characteristics of ozone. which is one of active oxygen species, have been measured experimentally. Generation characteristics of other active oxygen species have been estimated by chemical reaction simulation. As a result, it has been clarified that pulsed silent discharge can achieve highly nonequilibrium plasma conditions and generate active oxygen species efficiently.