Pendeo-EpitaxyTM Process for Aluminum Gallium Nitride Thin Films on Silicon Carbide Substrates via Metalorganic Chemical Vapor Deposition

Authors :: Edward A. Preble
Kevin J. Linthicum
Robert F. Davis
Brian M. Robin
Pradeep Rajagopal
Thomas Gehrke
E.P. Carlson
Source :: Materials Science Forum. :1491-1494
Publication Year :: 2000
Publisher :: Trans Tech Publications, Ltd., 2000.

Subjects :: Auger electron spectroscopy
Materials science
Mechanical Engineering
chemistry.chemical_element
Chemical vapor deposition
Nitride
Combustion chemical vapor deposition
Condensed Matter Physics
Epitaxy
chemistry.chemical_compound
chemistry
Chemical engineering
Mechanics of Materials
Silicon carbide
General Materials Science
Thin film
Gallium

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