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Thinning Process Induced Surface Defects in Ultra-Thin Si Wafer

Authors :
Hiroaki Kobayashi
M. Murugesan
C. Miyazaki
Mitsumasa Koyanagi
Takafumi Fukushima
H. Shimamoto
Tetsu Tanaka
Hiroshi Nohira
Source :
Extended Abstracts of the 2011 International Conference on Solid State Devices and Materials.
Publication Year :
2011
Publisher :
The Japan Society of Applied Physics, 2011.

Subjects

Subjects :
Surface (mathematics)
Materials science
Thinning
Scientific method
Wafer
Nanotechnology

Details

Database :
OpenAIRE
Journal :
Extended Abstracts of the 2011 International Conference on Solid State Devices and Materials
Accession number :
edsair.doi...........22cdefa13eb523d4132b662cffa457f5
Full Text :
https://doi.org/10.7567/ssdm.2011.p-2-2
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