Space-charge polarisation dielectric behaviour of precursor derived monoclinic HfO2

Subjects

Subjects :

Process Chemistry and Technology
Materials Chemistry
Ceramics and Composites
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials

Details

ISSN :

02728842

Volume :

48

Database :

OpenAIRE

Journal :

Ceramics International

Accession number :

edsair.doi...........26070da15375fc56420ce46316ce66e9

Full Text :

https://doi.org/10.1016/j.ceramint.2022.01.182