Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor

Subjects

Subjects :

General Physics and Astronomy
Surfaces and Interfaces
General Chemistry
Condensed Matter Physics
Surfaces, Coatings and Films

Details

ISSN :

01694332

Volume :

620

Database :

OpenAIRE

Journal :

Applied Surface Science

Accession number :

edsair.doi...........26702cd3df9dbf42f2a4b098e23f8ceb

Full Text :

https://doi.org/10.1016/j.apsusc.2023.156834