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Dual Layer Pt Metal Nanocrystal Flash for Multi-Level-Cell NAND Application

Authors :
Ralf Hofmann
Gaurav Singh Bisht
Souvik Mahapatra
Kaushal K. Singh
P.K. Singh
Source :
2009 IEEE International Memory Workshop.
Publication Year :
2009
Publisher :
IEEE, 2009.

Abstract

Most of the current high-density Flash cells use multi-level-cell (MLC) technology to store 2-bits/cell to increase memory density. In this work, dual layer metal nanocrystal (NC) flash EEPROM device, with large memory window, good retention and 10 4 cycle endurance is reported. High-temperature retention, gate bias accelerated retention, read disturb and post- cycling retention measurements show excellent reliability of the NC devices which make them suitable for the MLC application.

Details

Database :
OpenAIRE
Journal :
2009 IEEE International Memory Workshop
Accession number :
edsair.doi...........2879760d4ca127eecaa1fd4d9b9cea6a