Alignment mark detection in CMOS materials with SCALPEL e-beam lithography

MLA

Joseph A. Felker, et al. “Alignment Mark Detection in CMOS Materials with SCALPEL E-Beam Lithography.” SPIE Proceedings, June 1999. EBSCOhost, https://doi.org/10.1117/12.351093.

APA

Joseph A. Felker, J. S. Kraus, Sailesh Mansinh Merchant, P. A. Orphanos, Isik C. Kizilyalli, F. Klemens, Leonidas E. Ocola, C. Biddick, Myrtle I. Blakey, Masis Mkrtchyan, Avi Kornblit, Warren K. Waskiewicz, Nace Layadi, James Alexander Liddle, Gregg M. Gallatin, & Reginald C. Farrow. (1999). Alignment mark detection in CMOS materials with SCALPEL e-beam lithography. SPIE Proceedings. https://doi.org/10.1117/12.351093

Chicago

Joseph A. Felker, J. S. Kraus, Sailesh Mansinh Merchant, P. A. Orphanos, Isik C. Kizilyalli, F. Klemens, Leonidas E. Ocola, et al. 1999. “Alignment Mark Detection in CMOS Materials with SCALPEL E-Beam Lithography.” SPIE Proceedings, June. doi:10.1117/12.351093.