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Tube‐type plasma‐enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%

Authors :
Baochen Liao
Xinyuan Wu
Weiliang Wu
Changming Liu
Sheng Ma
Shaozhou Wang
Tong Xie
Qiang Wang
Zheren Du
Wenzhong Shen
Xiang Li
Weimin Li
Bram Hoex
Source :
Progress in Photovoltaics: Research and Applications. 31:52-61
Publication Year :
2022
Publisher :
Wiley, 2022.

Details

ISSN :
1099159X and 10627995
Volume :
31
Database :
OpenAIRE
Journal :
Progress in Photovoltaics: Research and Applications
Accession number :
edsair.doi...........2c5fe6e1101fc22c0c206c9d34079dbf
Full Text :
https://doi.org/10.1002/pip.3607