Use of near atmospheric pressure and low pressure techniques to modification DLC film surface

Diamond-like carbon (DLC) films have been use in numerous industrial applications due to its mechanical properties such as low friction coefficient, high hardness, and high adherence on different substrate materials. It has been demonstrated that the DLC surface can be modified with oxygen plasma treatment. The purpose of this paper is to study two kinds of surface treatments (atmospheric and low pressures) using oxygen gas for different etching exposure times in DLC films. Plasma durability along the time was also evaluated. DLC films were deposited using plasma enhanced chemical vapor deposition technique. The properties of DLC treated for both techniques in different exposure times were investigated through Raman, AFM and contact angle measurements. D band position slightly shifts toward lower wave numbers after oxygen plasma etching treatment whilst the surface becomes rougher, although the roughness values are still lower. A conventional wetting contact angle method was used to study the surface properties of DLC films with different treatments. The wetting contact angle reduced significantly due to the increase of carbon–oxygen sites on the surface.