Back to Search Start Over

Comparative investigation of GaAsSb/InGaAs type-II and InP/InGaAs type-I doped-channel field-effect transistors

Authors :
Jung-Hui Tsai
Fu-Min Wang
Te-Kuang Chiang
Yi-Chen Wu
Chung-Cheng Chiang
Source :
Semiconductors. 49:254-258
Publication Year :
2015
Publisher :
Pleiades Publishing Ltd, 2015.

Abstract

DC performance of GaAsSb/InGaAs type-II and InP/InGaAs type-I doped-channel field-effect transistors (DCFETs) is demonstrated and compared by two-dimensional simulated analysis. As compared with the traditional InP/InGaAs DCFET, the GaAsSb/InGaAs DCFET exhibits a higher drain current of 8.05 mA, a higher transconductance of 216.24 mS/mm, and a lower gate turn-on voltage of 0.25 V for the presence of a relatively large conduction band discontinuity (ΔE c ≈ 0.4 eV) at GaAsSb/InGaAs heterostructure and the formation of two-dimensional electron gas in the n +-InGaAs doping channel. However, due to the tunneling effect under large gate-to-source bias, it results in considerably large gate leakage current in the GaAsSb/InGaAs DCFET.

Details

ISSN :
10906479 and 10637826
Volume :
49
Database :
OpenAIRE
Journal :
Semiconductors
Accession number :
edsair.doi...........2f0946f34fc22eb62205ab0913dfa5b2
Full Text :
https://doi.org/10.1134/s1063782615020244