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Deformation behavior during nanoindentation of epitaxial ZnO thin films on sapphire substrate

Authors :
Seong-Ju Park
Tae Geol Lee
Kyoung-Kook Kim
R. Navamathavan
Dae-Kue Hwang
Jun-Hee Hahn
Gwang-Seok Kim
Source :
Materials Letters. 61:2443-2445
Publication Year :
2007
Publisher :
Elsevier BV, 2007.

Abstract

Nanoindentation studies were carried out on epitaxial ZnO thin films on (0001) sapphire substrates grown by radio frequency magnetron sputtering. A single discontinuity (‘pop-in’) in the load–displacement curve was observed at a specific depth (13−16 nm) irrespective of the film thickness. The physical mechanism responsible for the ‘pop-in’ event in these epitaxial films may be due to the nucleation, propagation and interaction behavior of the glissile threading dislocations during mechanical deformation. Indentation well below the critical depth was found to be plastic deformation behavior (residual impression of 4 nm).

Details

ISSN :
0167577X
Volume :
61
Database :
OpenAIRE
Journal :
Materials Letters
Accession number :
edsair.doi...........38bfcdfdbad56efb8ee04621593b77b0