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Epitaxial growth of Bi2Se3 topological insulator thin films on Si (111)
- Source :
- Journal of Applied Physics. 109:103702
- Publication Year :
- 2011
- Publisher :
- AIP Publishing, 2011.
-
Abstract
- In this paper, we report the epitaxial growth of Bi2Se3 thin films on Si (111) substrate, using molecular beam epitaxy (MBE). We show that the as-grown samples have good crystalline quality, and their surfaces exhibit terracelike quintuple layers. Angel-resolved photoemission experiments demonstrate single-Dirac-conelike surface states. These results combined with the temperature- and thickness-dependent magneto-transport measurements, suggest the presence of a shallow impurity band. Below a critical temperature of ∼100K, the surface states of a 7 nm thick film contribute up to 50% of the total conduction.
Details
- ISSN :
- 10897550 and 00218979
- Volume :
- 109
- Database :
- OpenAIRE
- Journal :
- Journal of Applied Physics
- Accession number :
- edsair.doi...........395e029bf67d84d5b8f33ce54daa5895