Cite

Plasma-deposited silicon oxide barrier films on polyethersulfone substrates: temperature and thickness effects

MLA

C. C. Chiang, et al. “Plasma-Deposited Silicon Oxide Barrier Films on Polyethersulfone Substrates: Temperature and Thickness Effects.” Surface and Coatings Technology, vol. 197, July 2005, pp. 253–59. EBSCOhost, https://doi.org/10.1016/j.surfcoat.2004.09.033.



APA

C. C. Chiang, L.-S. Chang, C. L. Huang, Y. J. Gao, W. C. Lo, Heng-I Lin, Ray-Hua Horng, & Dong-Sing Wuu. (2005). Plasma-deposited silicon oxide barrier films on polyethersulfone substrates: temperature and thickness effects. Surface and Coatings Technology, 197, 253–259. https://doi.org/10.1016/j.surfcoat.2004.09.033



Chicago

C. C. Chiang, L.-S. Chang, C. L. Huang, Y. J. Gao, W. C. Lo, Heng-I Lin, Ray-Hua Horng, and Dong-Sing Wuu. 2005. “Plasma-Deposited Silicon Oxide Barrier Films on Polyethersulfone Substrates: Temperature and Thickness Effects.” Surface and Coatings Technology 197 (July): 253–59. doi:10.1016/j.surfcoat.2004.09.033.