Direct patterning on reduced graphene oxide nanosheets using femtosecond laser pulses

Micro- and nanostructures were fabricated directly on graphene nanosheets by controlling the conditions of femtosecond laser pulse etching. High quality graphene micro- and nanostructures with a minimum width of 492 nm were obtained as the graphene nanosheets used in our experiments were large-scale, uniform and highly conductive. Various complex patterns were successfully created through femtosecond laser etching. Furthermore, by managing the laser energy, the graphene under the Au electrodes could be completely or partly removed. This technology of direct patterning of micro- and nanostructures on graphene through femtosecond laser technology might pave the way for the integration of graphene-based electronic microdevices.