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Correlation between Intrinsic Stress Distribution and Crystallographic Defects Density Profile in Czochralski Silicon after CMOS Processing

Authors :
W. Jung
T. Piotrowski
Source :
Solid State Phenomena. :519-524
Publication Year :
1999
Publisher :
Trans Tech Publications, Ltd., 1999.

Details

ISSN :
16629779
Database :
OpenAIRE
Journal :
Solid State Phenomena
Accession number :
edsair.doi...........3ce14610a1a80c41697bfad324ddb692
Full Text :
https://doi.org/10.4028/www.scientific.net/ssp.69-70.519