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Correlation between Intrinsic Stress Distribution and Crystallographic Defects Density Profile in Czochralski Silicon after CMOS Processing
- Source :
- Solid State Phenomena. :519-524
- Publication Year :
- 1999
- Publisher :
- Trans Tech Publications, Ltd., 1999.
Details
- ISSN :
- 16629779
- Database :
- OpenAIRE
- Journal :
- Solid State Phenomena
- Accession number :
- edsair.doi...........3ce14610a1a80c41697bfad324ddb692
- Full Text :
- https://doi.org/10.4028/www.scientific.net/ssp.69-70.519