Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers

MLA

Dong Ok Shin, et al. “Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers.” Advanced Materials, vol. 20, May 2008, pp. 1898–904. EBSCOhost, https://doi.org/10.1002/adma.200702930.

APA

Dong Ok Shin, Seong-Jun Jeong, Bong Hoon Kim, Sang Won Kang, Se-Hun Kwon, Sang Ouk Kim, & Guodong Xia. (2008). Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers. Advanced Materials, 20, 1898–1904. https://doi.org/10.1002/adma.200702930

Chicago

Dong Ok Shin, Seong-Jun Jeong, Bong Hoon Kim, Sang Won Kang, Se-Hun Kwon, Sang Ouk Kim, and Guodong Xia. 2008. “Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers.” Advanced Materials 20 (May): 1898–1904. doi:10.1002/adma.200702930.