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Effects and Regularity of Different Slit & Bar Design on TFT Characteristics

Authors :
郭建 Guo Jian
刘翔 Liu Xiang
金基用 Kim Ki-yong
薛建设 Xue Jian-she
明星 Ming Xing
周伟峰 Zhou Wei-feng
陈旭 Chen Xu
闵泰烨 Min Tai-ye
Source :
Chinese Journal of Liquid Crystals and Displays. 26:165-169
Publication Year :
2011
Publisher :
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2011.

Abstract

By analyzing the relation among different slit bar design of mask,TFT channel profile and electric characteristic,it's found that the TFT electric characteristic,ripple size and channel FICD bias are becoming better while slit or bar size decreases.The slit size has greater influence than bar size on TFT characteristic.Considering the ratio of short in the corner of channel,the small slit bar design is suitable for four mask processing,and the corner defect can be avoided by tuning bar size.

Details

ISSN :
10072780
Volume :
26
Database :
OpenAIRE
Journal :
Chinese Journal of Liquid Crystals and Displays
Accession number :
edsair.doi...........3f66604bb081fc25345af30ff5ebfe1c
Full Text :
https://doi.org/10.3788/yjyxs20112602.0165