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Optimization of Extension Doping Condition of FinFETs for Ultra-Low-Power Applications

Authors :
Shin-ichi O'uchi
M. Masahara
T. Matsukawa
S. Migita
Y. Morita
Takahiro Mori
Shintaro Otsuka
Y.X. Liu
Hiroshi Fuketa
Source :
Extended Abstracts of the 2015 International Conference on Solid State Devices and Materials.
Publication Year :
2015
Publisher :
The Japan Society of Applied Physics, 2015.

Subjects

Subjects :
Ultra low power
Materials science
business.industry
Doping
Optoelectronics
Extension (predicate logic)
business

Details

Database :
OpenAIRE
Journal :
Extended Abstracts of the 2015 International Conference on Solid State Devices and Materials
Accession number :
edsair.doi...........43b07756f74f71bc5d365d561b591cc3
Full Text :
https://doi.org/10.7567/ssdm.2015.n-2-1
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