Thermally Induced Structural Modification of Nanometer-Order Mo/Si Multilayers by the Spectral Reflectance of Laser-Plasma Soft X-Rays

Thermally induced structural modification of a nm-order multilayer of Mo/Si was investigated by spectral reflect-ance of soft X-rays from laser-produced plasma. Dependence of reflectivity of the nm-order multilayers on the incidence angle of soft X-rays indicated that some structural changes start to occur at 300°C and that the nm-order multilayer structures shrink at 500°C because of the formation of Mo-silicide. These results were found to be consistent with the cross-sectional transmission electron microscope observations. It is clearly shown that measurement of spectral reflectance of soft X-rays from laser plasma is a powerful method for analyzing nm-order structural modifications of multilayers.