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Analysis for Interaction of Laser-Ablation/Metallization on the Screen-Printed Rear-Side Local Contact

Authors :
Li, A.
Chen, W.-H.
Wang, L.-T.
Liu, H.-W.
Lai, C.-W.
Huang, C.-C.
Lin, Y.-M.
Fang, T.
Chen, W.-P.
Publication Year :
2012
Publisher :
WIP, 2012.

Abstract

27th European Photovoltaic Solar Energy Conference and Exhibition; 1293-1295<br />An analysis method was presented to measure the contact resistivity of rear-side local openings to reveal the interaction of laser-ablation/metallization. Different laser-ablating conditions were compared with different pastes, firing conditions, and film stacks. No unique laser recipe can be utilized for whole metallization conditions from the contact resistivity point of view. Using an appropriate laser ablation recipe of nanosecond laser combined with a proper metallization condition, the contact resistivity of ~58.59 mΩ-cm2 for line- pattern could be comparable to the value of 40-55 mΩ-cm2 achieved by the picosecond laser.

Details

Language :
English
Database :
OpenAIRE
Accession number :
edsair.doi...........46d62406150a27516e954520a3cc3919
Full Text :
https://doi.org/10.4229/27theupvsec2012-2av.6.36