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Low-energy electron exposure and reactive ion etching characteristics of hybrid EUV photoresist synthesized by molecular atomic layer deposition
- Source :
- International Conference on Extreme Ultraviolet Lithography 2022.
- Publication Year :
- 2022
- Publisher :
- SPIE, 2022.
Details
- Database :
- OpenAIRE
- Journal :
- International Conference on Extreme Ultraviolet Lithography 2022
- Accession number :
- edsair.doi...........48236dccac0716820eb43469fd1ba586
- Full Text :
- https://doi.org/10.1117/12.2641794