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CoSi2 growth on Si(001) by reactive deposition epitaxy: Effects of high-flux, low-energy ion irradiation
- Source :
- Journal of Applied Physics. 100:013510
- Publication Year :
- 2006
- Publisher :
- AIP Publishing, 2006.
-
Abstract
- CoSi2 layers
Details
- ISSN :
- 10897550 and 00218979
- Volume :
- 100
- Database :
- OpenAIRE
- Journal :
- Journal of Applied Physics
- Accession number :
- edsair.doi...........48dccc76c31df2e47f5ef606ba6677da
- Full Text :
- https://doi.org/10.1063/1.2213351