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Enhanced Wear-Rate Leveling for PRAM Lifetime Improvement Considering Process Variation

Authors :
Weng Kaiheng
Jianbo Dong
Ying Wang
Yinhe Han
Xiaowei Li
Source :
IEEE Transactions on Very Large Scale Integration (VLSI) Systems. 24:92-102
Publication Year :
2016
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 2016.

Abstract

The limited write endurance is one of the major obstacles for phase-change random access memory (PRAM)-based main memory. Traditionally, wear-leveling (WL) techniques were proposed to enhance its lifetime by balancing write traffic. However, these techniques do not concern the endurance variation in PRAM chips. When different PRAM cells have distinct endurance, balanced writes results in lifetime degradation due to the weakest cells. In this paper, we first define a new metric-wear rate (i.e., writes/endurance) considering both the write traffic and endurance distribution from application and hardware, respectively. After investigating the writing behavior of applications and endurance variation, we propose an architecture-level leveling mechanism to balance wear rate of cells across the PRAM chip. Hardware and algorithm to support the proposed leveling mechanism are presented. Moreover, there is an important tradeoff between endurance improvement and swapping data volume. To co-optimize endurance and swapping, this situation is formulated as a maximum weight perfect matching problem in bipartite graph. Thereafter, a novel algorithm that minimizes wear-rate and swapping by employing Kuhn–Munkras algorithm is proposed to maximize PRAM lifetime and minimize performance degradation. The experimental results show $\sim 17 \times $ lifetime improvement over prior WL.

Details

ISSN :
15579999 and 10638210
Volume :
24
Database :
OpenAIRE
Journal :
IEEE Transactions on Very Large Scale Integration (VLSI) Systems
Accession number :
edsair.doi...........496172c3f0677ed39d15287f32661317
Full Text :
https://doi.org/10.1109/tvlsi.2015.2395415