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Characteristics of InGaP/GaAs delta-doped heterojunction bipolar transistor

Authors :
Jing-Yuh Chen
Shiou-Ying Cheng
Wei-Chou Wang
S.C. Feng
Hsi-Jen Pan
Kuo-Hui Yu
Wen-Chau Liu
Source :
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:751
Publication Year :
2000
Publisher :
American Vacuum Society, 2000.

Abstract

An InGaP/GaAs heterojunction bipolar transistor with a δ-doped sheet structure has been fabricated successfully. High current gain, especially in the very low collector current regime, low collector-emitter offset voltage (ΔVCE) characteristics are obtained. There is an extremely small offset voltage of about 55 meV due to the elimination of the potential spike at the emitter-base heterojunction by a δ-doped sheet and a 50 A very thin setback layer. On the other hand, the high current gain of 280 also reveals that the degradation of current gain due to the potential spike can be avoided. In addition, the influence of the δ-doped sheet and the undoped setback on device properties is studied.

Details

ISSN :
0734211X
Volume :
18
Database :
OpenAIRE
Journal :
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Accession number :
edsair.doi...........49a67be8f69d4727652675031a87f10d
Full Text :
https://doi.org/10.1116/1.591271