Magneto-optic spatial light modulator with one-step pattern formation

We demonstrated a magneto-optic spatial light modulator with one-step pattern formation of iron-garnet films on ion-milled substrates by LPE. The one-step pixel growth is based on the combination of a single-crystal epitaxial film growth (pixel area) by LPE and a impeded film growth (pixel gap area) on a substrate whose surface has been locally damaged and milled by ion bombardment before film deposition. This method overcomes the disadvantages associated with groove etching of the conventional MOSLM. The fabricated prototype MOSLM is switched by applying driving currents of 40 mA for the bottom conductor line and 80 mA for the top conductor line under external bias field of 20 Oe, which is over 2 times smaller than that of the conventional MOSLM. These results strongly suggest that the novel MOSLM can provide higher resolution, simpler fabrication process, more compact systems and lower driving current. Also, the selective-area LPE method offers new possibilities for the fabrication of integrated magneto-optic light switch arrays, magnetic waveguides and similar devices.