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High-resolution direct-write patterning using focused ion beams
- Source :
- MRS Bulletin. 39:336-341
- Publication Year :
- 2014
- Publisher :
- Springer Science and Business Media LLC, 2014.
-
Abstract
- Over the last few years, significant improvements in sources, columns, detectors, control software, and accessories have enabled a wealth of new focused ion beam applications. In addition, modeling has provided many insights into ion-sample interactions and the resultant effects on the sample. With the knowledge gained, the community has found new ion-beam induced chemistries and ion-beam sources, allowing extending nanostructure fabrication and material deposition to smaller dimensions and better control for direct write and patterning. Insignificant proximity effects in resist-based ion beam lithography, combined with the availability of sub-nm ion spot sizes, opens the way to sub-10 nm structures and dense patterns. Additionally, direct-write ion beam nanomachining can process multilevel structures with arbitrary depths in one single process step, with all the information included in a single standard design file, thus enabling fabrication applications not achievable with any other technique. © 2014 Materials Research Society.
Details
- ISSN :
- 19381425 and 08837694
- Volume :
- 39
- Database :
- OpenAIRE
- Journal :
- MRS Bulletin
- Accession number :
- edsair.doi...........502b260dee9b5cec9fd2603b8ef03103