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Screen Printable Boron Doping Paste and Its Process for n-Type PERT Solar Cells

Authors :
Tetsuya Sato
Shih-Peng Hsu
Shimizu Shigenori
Chen-Hsun Du
Akihiro Orita
Nojiri Takeshi
Source :
IEEE Journal of Photovoltaics. 8:483-486
Publication Year :
2018
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 2018.

Abstract

We have developed new boron paste materials for the process of diffusing crystalline silicon solar cells. The boron paste promotes pattern-forming, long carrier lifetime, and allows good sheet resistance uniformity. The cell efficiency achieved when applying boron paste to an n-type PERT cell was practically excellent. A high efficiency was also obtained under a codiffusion process with POCl3 gas for a simplifying process. We reported on the diffusion characteristic and process details of the boron paste in this paper.

Details

ISSN :
21563403 and 21563381
Volume :
8
Database :
OpenAIRE
Journal :
IEEE Journal of Photovoltaics
Accession number :
edsair.doi...........507e29e0d04bdcd0228c7cad1160bc85
Full Text :
https://doi.org/10.1109/jphotov.2018.2797973