Hydrogen diffusion at moderate temperatures in p-type Czochralski silicon

MLA

Reinhart Job, et al. “Hydrogen Diffusion at Moderate Temperatures in P-Type Czochralski Silicon.” Journal of Applied Physics, vol. 96, Dec. 2004, pp. 7080–86. EBSCOhost, https://doi.org/10.1063/1.1812379.

APA

Reinhart Job, Y. Ma, Y. L. Huang, & A.G. Ulyashin. (2004). Hydrogen diffusion at moderate temperatures in p-type Czochralski silicon. Journal of Applied Physics, 96, 7080–7086. https://doi.org/10.1063/1.1812379

Chicago

Reinhart Job, Y. Ma, Y. L. Huang, and A.G. Ulyashin. 2004. “Hydrogen Diffusion at Moderate Temperatures in P-Type Czochralski Silicon.” Journal of Applied Physics 96 (December): 7080–86. doi:10.1063/1.1812379.