Back to Search Start Over

Giant magnetoresistance in multilayers electrodeposited on n-Si

Authors :
OI Kasyutich
AP O'Keeffe
Walther Schwarzacher
L. S. de Oliveira
André A. Pasa
Source :
Applied Physics Letters. 73:1002-1004
Publication Year :
1998
Publisher :
AIP Publishing, 1998.

Abstract

Co–Ni–Cu/Cu multilayers have been electrodeposited directly onto n-type Si substrates. This removes the need to use a seed-layer deposited by some other method as part of the growth process and makes electrodeposition a significantly more convenient method for fabricating films that exhibit giant magnetoresistance (GMR). A maximum GMR of over 10% and a sensitivity of over 0.04%/Oe were recorded. The GMR and sensitivity of the multilayers both increase with increasing Cu layer thickness.

Details

ISSN :
10773118 and 00036951
Volume :
73
Database :
OpenAIRE
Journal :
Applied Physics Letters
Accession number :
edsair.doi...........5156c09843dfc19c4d60bf147e45dc57