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Giant magnetoresistance in multilayers electrodeposited on n-Si
- Source :
- Applied Physics Letters. 73:1002-1004
- Publication Year :
- 1998
- Publisher :
- AIP Publishing, 1998.
-
Abstract
- Co–Ni–Cu/Cu multilayers have been electrodeposited directly onto n-type Si substrates. This removes the need to use a seed-layer deposited by some other method as part of the growth process and makes electrodeposition a significantly more convenient method for fabricating films that exhibit giant magnetoresistance (GMR). A maximum GMR of over 10% and a sensitivity of over 0.04%/Oe were recorded. The GMR and sensitivity of the multilayers both increase with increasing Cu layer thickness.
Details
- ISSN :
- 10773118 and 00036951
- Volume :
- 73
- Database :
- OpenAIRE
- Journal :
- Applied Physics Letters
- Accession number :
- edsair.doi...........5156c09843dfc19c4d60bf147e45dc57