Permanent Magnet Microwave Source For Generation Of EUV Light

A permanent magnet 6.4 GHz microwave plasma generator has been designed and constructed at Plasma and Ion Source Technology group at Lawrence Berkeley National Laboratory for applications in Extreme Ultraviolet Lithography (EUVL). In order to produce 13.5 nm EUV light, Xenon plasma was formed with the goal of producing Xe10+ ions, which are associated with the formation of 13.5 nm radiation. The goal was to diagnose the source plasma by extracting Xe‐ ions from the source plasma and by measuring the EUV light spectrum with a grazing incidence monochromator. 13.5 nm light was observed in the measurements indicating that Xe10+ existed in the plasma.