Engineering of InN epilayers by repeated deposition of ultrathin layers in pulsed MOCVD growth

MLA

D. Dobrovolskas, et al. “Engineering of InN Epilayers by Repeated Deposition of Ultrathin Layers in Pulsed MOCVD Growth.” Applied Surface Science, vol. 427, Jan. 2018, pp. 1027–32. EBSCOhost, https://doi.org/10.1016/j.apsusc.2017.09.074.

APA

D. Dobrovolskas, Tadas Malinauskas, Arūnas Kadys, Gintautas Tamulaitis, J. Mickevičius, T. Steponavičius, & Marek Kolenda. (2018). Engineering of InN epilayers by repeated deposition of ultrathin layers in pulsed MOCVD growth. Applied Surface Science, 427, 1027–1032. https://doi.org/10.1016/j.apsusc.2017.09.074

Chicago

D. Dobrovolskas, Tadas Malinauskas, Arūnas Kadys, Gintautas Tamulaitis, J. Mickevičius, T. Steponavičius, and Marek Kolenda. 2018. “Engineering of InN Epilayers by Repeated Deposition of Ultrathin Layers in Pulsed MOCVD Growth.” Applied Surface Science 427 (January): 1027–32. doi:10.1016/j.apsusc.2017.09.074.