Back to Search Start Over

STT-MRAM for Embedded Memory Applications

Authors :
Zihui Wang
Yiming Huai
Longqian Hu
Xiaojie Hao
Zhiqiang Wei
Dongha Jung
Bing Yen
Jing Zhang
Kimihiro Satoh
Pengfa Xu
Woojin Kim
Lienchang Wang
Source :
2020 IEEE International Memory Workshop (IMW).
Publication Year :
2020
Publisher :
IEEE, 2020.

Abstract

With traditional embedded memories, such as eFlash and SRAM, facing major challenge of scaling beyond 28 nm, STT-MRAM stands out from competing emerging NVM technologies as the preferred technology for both embedded flash and SRAM replacements. Having high data retention, reflow compatibility and high endurance, MRAM is ready for production to replace eFlash at 28 nm node and below. On the other end of the spectrum, by tuning magnetic properties of magnetic tunnel junction storage layers, MRAM can achieve high speed/endurance, and offer higher density compared with embedded SRAM at advance nodes.

Details

Database :
OpenAIRE
Journal :
2020 IEEE International Memory Workshop (IMW)
Accession number :
edsair.doi...........54ed6ded252046d05108fca062c23dfb
Full Text :
https://doi.org/10.1109/imw48823.2020.9108144