Plasma-assisted chemical vapour deposition of diamond by hollow cathode arc discharge

MLA

K. Hammer, et al. “Plasma-Assisted Chemical Vapour Deposition of Diamond by Hollow Cathode Arc Discharge.” Thin Solid Films, vol. 219, Oct. 1992, pp. 4–6. EBSCOhost, https://doi.org/10.1016/0040-6090(92)90716-o.

APA

K. Hammer, J. Stiegler, S. Roth, & W. Scharff. (1992). Plasma-assisted chemical vapour deposition of diamond by hollow cathode arc discharge. Thin Solid Films, 219, 4–6. https://doi.org/10.1016/0040-6090(92)90716-o

Chicago

K. Hammer, J. Stiegler, S. Roth, and W. Scharff. 1992. “Plasma-Assisted Chemical Vapour Deposition of Diamond by Hollow Cathode Arc Discharge.” Thin Solid Films 219 (October): 4–6. doi:10.1016/0040-6090(92)90716-o.