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Chemical Kinetics Simulation for H+NCl3+HI Chemical Laser System

Authors :
多丽萍 Duo Liping
李留成 Li Liucheng
杨柏龄 Yang Bailing
Source :
Chinese Journal of Lasers. 36:367-373
Publication Year :
2009
Publisher :
Shanghai Institute of Optics and Fine Mechanics, 2009.

Subjects

Subjects :
Chemical kinetics
Materials science
law
Analytical chemistry
Electrical and Electronic Engineering
Chemical laser
Atomic and Molecular Physics, and Optics
Electronic, Optical and Magnetic Materials
law.invention

Details

ISSN :
02587025
Volume :
36
Database :
OpenAIRE
Journal :
Chinese Journal of Lasers
Accession number :
edsair.doi...........5739b38c46dd2cd1d0edee9c83ac51db
Full Text :
https://doi.org/10.3788/cjl20093602.0367
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