Microstructure and Electrical Properties of Amorphous $ \hbox{Bi}_{5}\hbox{Nb}_{3}\hbox{O}_{15}$ Films Grown on Cu/Ti/$ \hbox{SiO}_{2}$/Si Substrates Using RF Magnetron Sputtering

MLA

Jinseong Kim, et al. “Microstructure and Electrical Properties of Amorphous $ \hbox{Bi}_{5}\hbox{Nb}_{3}\hbox{O}_{15}$ Films Grown on Cu/Ti/$ \hbox{SiO}_{2}$/Si Substrates Using RF Magnetron Sputtering.” IEEE Transactions on Electron Devices, vol. 58, May 2011, pp. 1462–67. EBSCOhost, https://doi.org/10.1109/ted.2011.2111454.

APA

Jinseong Kim, Sahn Nahm, Dong-Soo Paik, Jong-Hee Kim, Leeseung Kang, Jong-Woo Sun, Chong Yun Kang, Tae Hyun Sung, Tae-Geun Seong, & Kyung-Hoon Cho. (2011). Microstructure and Electrical Properties of Amorphous $ \hbox{Bi}_{5}\hbox{Nb}_{3}\hbox{O}_{15}$ Films Grown on Cu/Ti/$ \hbox{SiO}_{2}$/Si Substrates Using RF Magnetron Sputtering. IEEE Transactions on Electron Devices, 58, 1462–1467. https://doi.org/10.1109/ted.2011.2111454

Chicago

Jinseong Kim, Sahn Nahm, Dong-Soo Paik, Jong-Hee Kim, Leeseung Kang, Jong-Woo Sun, Chong Yun Kang, Tae Hyun Sung, Tae-Geun Seong, and Kyung-Hoon Cho. 2011. “Microstructure and Electrical Properties of Amorphous $ \hbox{Bi}_{5}\hbox{Nb}_{3}\hbox{O}_{15}$ Films Grown on Cu/Ti/$ \hbox{SiO}_{2}$/Si Substrates Using RF Magnetron Sputtering.” IEEE Transactions on Electron Devices 58 (May): 1462–67. doi:10.1109/ted.2011.2111454.