Enabling Sub-10nm Lithography with Atomic Layer Deposition and Block Copolymer Self Assembly

MLA

Ricardo Ruiz, et al. “Enabling Sub-10nm Lithography with Atomic Layer Deposition and Block Copolymer Self Assembly.” ECS Meeting Abstracts, Aug. 2014, p. 1610. EBSCOhost, https://doi.org/10.1149/ma2014-02/30/1610.

APA

Ricardo Ruiz, Yves-Andre Chapuis, Lei Wan, Shisheng Xiong, He Gao, Kanayialal Patel, Elizabeth Dobisz, Alexei Bogdanov, Paul Nealey, & Thomas Albrecht. (2014). Enabling Sub-10nm Lithography with Atomic Layer Deposition and Block Copolymer Self Assembly. ECS Meeting Abstracts, 1610. https://doi.org/10.1149/ma2014-02/30/1610

Chicago

Ricardo Ruiz, Yves-Andre Chapuis, Lei Wan, Shisheng Xiong, He Gao, Kanayialal Patel, Elizabeth Dobisz, Alexei Bogdanov, Paul Nealey, and Thomas Albrecht. 2014. “Enabling Sub-10nm Lithography with Atomic Layer Deposition and Block Copolymer Self Assembly.” ECS Meeting Abstracts, August, 1610. doi:10.1149/ma2014-02/30/1610.