Effects of annealing on properties of Ta2O5thin films deposited by ion beam sputtering

Authors :: 陈德应 Chen De-ying
刘丹丹 Liu Dandan
季一勤 Ji Yiqin
刘华松 Liu Huasong
王利栓 Wang Lishuan
姜承慧 Jiang Chenghui
Source :: Optics and Precision Engineering. 22:2645-2651
Publication Year :: 2014
Publisher :: Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2014.

Subjects :: Ion beam sputtering
Materials science
Annealing (metallurgy)
business.industry
Analytical chemistry
Optoelectronics
business
Atomic and Molecular Physics, and Optics
Electronic, Optical and Magnetic Materials

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