Deposition of transparent conducting indium tin oxide thin films by reactive ion plating

The deposition of transparent conducting indium tin oxide thin films by reactive ion plating is described. The films were prepared by evaporating indium and tin from a resistance-heated vapour source in an oxygen atmosphere. The glass substrates were heated in situ during the deposition. Electrical resistivities of 2 × 10 -4 ω cm were obtained, and the average visible transmittance was 85% with values in excess of 90% being achieved at a wavelength of 0.50 μm.