Resist reflow for 193-nm low-K1 lithography contacts

MLA

Kirk J. Strozewski, et al. “Resist Reflow for 193-Nm Low-K1 Lithography Contacts.” Advances in Resist Technology and Processing XX, June 2003. EBSCOhost, https://doi.org/10.1117/12.485186.

APA

Kirk J. Strozewski, Patrick K. Montgomery, Plamen Tzviatkov, Mario Reybrouck, Grozdan Grozev, Kevin D. Lucas, Mireille Maenhoudt, & Lena Zavyalova. (2003). Resist reflow for 193-nm low-K1 lithography contacts. Advances in Resist Technology and Processing XX. https://doi.org/10.1117/12.485186

Chicago

Kirk J. Strozewski, Patrick K. Montgomery, Plamen Tzviatkov, Mario Reybrouck, Grozdan Grozev, Kevin D. Lucas, Mireille Maenhoudt, and Lena Zavyalova. 2003. “Resist Reflow for 193-Nm Low-K1 Lithography Contacts.” Advances in Resist Technology and Processing XX, June. doi:10.1117/12.485186.