Mechanism of single-layer 193-nm dissolution inhibition resist

MLA

Gary Dabbagh, et al. “Mechanism of Single-Layer 193-Nm Dissolution Inhibition Resist.” Advances in Resist Technology and Processing XVII, June 2000. EBSCOhost, https://doi.org/10.1117/12.388275.

APA

Gary Dabbagh, K. Bolan, Jose T. de Sousa, Dan Osei, Richard S. Hutton, Omkaram Nalamasu, Arnost Reiser, Zhenglin Yan, Francis M. Houlihan, & Elsa Reichmanis. (2000). Mechanism of single-layer 193-nm dissolution inhibition resist. Advances in Resist Technology and Processing XVII. https://doi.org/10.1117/12.388275

Chicago

Gary Dabbagh, K. Bolan, Jose T. de Sousa, Dan Osei, Richard S. Hutton, Omkaram Nalamasu, Arnost Reiser, Zhenglin Yan, Francis M. Houlihan, and Elsa Reichmanis. 2000. “Mechanism of Single-Layer 193-Nm Dissolution Inhibition Resist.” Advances in Resist Technology and Processing XVII, June. doi:10.1117/12.388275.