Modification of Chemically Amplified Resists by Radical Copolymerization

Modification of a phenolic resist has been carried out by copolymerization with methacrylic monomers. Influence of irradiation source and its intensity has been studied by analyzing sensitive curves of a various resist composition. Inversion of imaging type at varying post exposure bake temperature has been investigated for resists based on copolymers containing methacrylic acid units, which has been related with crosslinking of macromolecules.