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Coater/developer-based techniques to achieve tight pitches towards high-NA EUV

Authors :
Kanzo Kato
Lior Huli
Nathan Antonovich
David Hetzer
Steven Grzeskowiak
Eric Liu
Akiteru Ko
Satoru Shimura
Shinichiro Kawakami
Takahiro Kitano
Seiji Nagahara
Luciana Meli
Indira Seshadri
Martin Burkhardt
Karen Petrillo
Source :
Advances in Patterning Materials and Processes XL.
Publication Year :
2023
Publisher :
SPIE, 2023.

Details

Database :
OpenAIRE
Journal :
Advances in Patterning Materials and Processes XL
Accession number :
edsair.doi...........62f26d28be561703578290b2c86ae190

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