Assessment of EUV resist readiness for 32-nm hp manufacturing and extendibility study of EUV ADT using state-of-the-art resist

MLA

Joo-On Park, et al. “Assessment of EUV Resist Readiness for 32-Nm Hp Manufacturing and Extendibility Study of EUV ADT Using State-of-the-Art Resist.” Alternative Lithographic Technologies, Mar. 2009. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........6530ec608bac5333a9f6cfe8c574f6e4&authtype=sso&custid=ns315887.

APA

Joo-On Park, Patrick P. Naulleau, Stefan Wurm, Liping Ren, Frank Goodwin, Jacque Georger, Todd R. Younkin, Tom Wallow, Bill Pierson, & Chawon Koh. (2009). Assessment of EUV resist readiness for 32-nm hp manufacturing and extendibility study of EUV ADT using state-of-the-art resist. Alternative Lithographic Technologies.

Chicago

Joo-On Park, Patrick P. Naulleau, Stefan Wurm, Liping Ren, Frank Goodwin, Jacque Georger, Todd R. Younkin, Tom Wallow, Bill Pierson, and Chawon Koh. 2009. “Assessment of EUV Resist Readiness for 32-Nm Hp Manufacturing and Extendibility Study of EUV ADT Using State-of-the-Art Resist.” Alternative Lithographic Technologies, March. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........6530ec608bac5333a9f6cfe8c574f6e4&authtype=sso&custid=ns315887.