Improved Thermal Stability of Ag Thin Films by Organic Subnanolayer at Interface with Silicon Oxide Layer

MLA

Yoshio Abe, et al. “Improved Thermal Stability of Ag Thin Films by Organic Subnanolayer at Interface with Silicon Oxide Layer.” Japanese Journal of Applied Physics, vol. 48, Nov. 2009, p. 118002. EBSCOhost, https://doi.org/10.1143/jjap.48.118002.

APA

Yoshio Abe, Katsutaka Sasaki, Terumasa Fudei, & Midori Kawamura. (2009). Improved Thermal Stability of Ag Thin Films by Organic Subnanolayer at Interface with Silicon Oxide Layer. Japanese Journal of Applied Physics, 48, 118002. https://doi.org/10.1143/jjap.48.118002

Chicago

Yoshio Abe, Katsutaka Sasaki, Terumasa Fudei, and Midori Kawamura. 2009. “Improved Thermal Stability of Ag Thin Films by Organic Subnanolayer at Interface with Silicon Oxide Layer.” Japanese Journal of Applied Physics 48 (November): 118002. doi:10.1143/jjap.48.118002.