Research on photomask process for FPD

Authors :: Kouichi Murakami
Takumi Uemura
Shuichi Ojima
Source :: Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology.
Publication Year :: 2019
Publisher :: SPIE, 2019.
Abstract: FSCE focused on resist materials and coordinate correction technology for FPD mask and carried out research on underlying technology. The results we obtained are reported.

Subjects :: Resist
business.industry
Computer science
Process (computing)
Photomask
Process engineering
business

Database :: OpenAIRE
Journal :: Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
Accession number :: edsair.doi...........6da7ffb95b3960a0701268271a857d20

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