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Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography

Authors :
Kenta Suzuki
Hiroshi Hiroshima
Sung-Won Youn
Source :
Japanese Journal of Applied Physics. 57:06HG03
Publication Year :
2018
Publisher :
IOP Publishing, 2018.

Details

ISSN :
13474065 and 00214922
Volume :
57
Database :
OpenAIRE
Journal :
Japanese Journal of Applied Physics
Accession number :
edsair.doi...........6e4bd1a77bec2daf6b46fdca6f8c3d90
Full Text :
https://doi.org/10.7567/jjap.57.06hg03