Impact of Hard Mask on Reflectivity for Litho-Etch-Litho-Etch Process in Double Patterning Lithography

Authors :: Frederick
Hung-Fei Kuo
Yu-Ting Chen
Ying-You Chen
Source :: Journal of Computational and Theoretical Nanoscience. 10:616-619
Publication Year :: 2013
Publisher :: American Scientific Publishers, 2013.

Subjects :: Materials science
business.industry
Extreme ultraviolet lithography
Process (computing)
General Chemistry
Condensed Matter Physics
Reflectivity
Computational Mathematics
Double patterning lithography
Multiple patterning
Optoelectronics
General Materials Science
X-ray lithography
Electrical and Electronic Engineering
business
Next-generation lithography
Hard mask

Full Text Access

Tools