Impact of the Low Temperature Gate Dielectrics on Device Performance and Bias-Stress Stabilities of a-IGZO Thin-Film Transistors

Authors :: Paul Heremans
Guido Groeseneken
Ajay Bhoolokam
Soeren Steudel
Jan Genoe
Manoj Nag
Source :: ECS Journal of Solid State Science and Technology. 4:N99-N102
Publication Year :: 2015
Publisher :: The Electrochemical Society, 2015.

Subjects :: Materials science
business.industry
Thin-film transistor
Optoelectronics
Dielectric
business
Bias stress
Electronic, Optical and Magnetic Materials

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