Cite
Al-Induced oriented-crystallization of Si films on quartz and its application to epitaxial template for Ge growth
MLA
Naoyuki Kawabata, et al. “Al-Induced Oriented-Crystallization of Si Films on Quartz and Its Application to Epitaxial Template for Ge Growth.” Solid-State Electronics, vol. 60, June 2011, pp. 7–12. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........724004c23f9374416a23817dba3b12f5&authtype=sso&custid=ns315887.
APA
Naoyuki Kawabata, Masashi Kurosawa, Kaoru Toko, Taizoh Sadoh, & Masanobu Miyao. (2011). Al-Induced oriented-crystallization of Si films on quartz and its application to epitaxial template for Ge growth. Solid-State Electronics, 60, 7–12.
Chicago
Naoyuki Kawabata, Masashi Kurosawa, Kaoru Toko, Taizoh Sadoh, and Masanobu Miyao. 2011. “Al-Induced Oriented-Crystallization of Si Films on Quartz and Its Application to Epitaxial Template for Ge Growth.” Solid-State Electronics 60 (June): 7–12. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........724004c23f9374416a23817dba3b12f5&authtype=sso&custid=ns315887.