A Study of Photoresist Pattern Freezing for Double Imaging using 172nm VUV Flood Exposure

Authors :: Harry J. Levinson
Yamaguchi Masanori
Ryoung-han Kim
Yohei Yamada
Jongwook Kye
Thomas Wallow
Source :: Journal of Photopolymer Science and Technology. 21:697-704
Publication Year :: 2008
Publisher :: Technical Association of Photopolymers, Japan, 2008.

Subjects :: Materials science
Polymers and Plastics
Flood myth
Organic Chemistry
Materials Chemistry
Multiple patterning
Nanotechnology
Photoresist

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